ALN coating device (high-density plasma sputtering ADMS device)
Forming crystalline AlN films with high-density plasma sputtering, compatible with full coating on three-dimensional shapes. Fully automated mass production equipment lineup.
A high-density plasma sputtering method developed in-house, the ADMS method (arc discharge type magnetron sputtering), enables the deposition of a dense AlN film on three-dimensional substrates, unlike anything seen before. It achieves a high-density plasma sputtering with ten times the amount of ions compared to conventional methods. With a unique high-reactivity sputtering process, crystalline AlN is formed at low temperatures below 500°C. This new thin-film formation device creates new surface functions for everything from electronic devices to mechanical parts.
- Company：神港精機 東京支店
- Price：Other
